Do you have a Master’s degree and are looking for fully funded PhD opportunities? Advanced Research Center for Nanolithography, Amsterdam, Netherlands is now accepting applications for several funded PhD programs across a range of research areas.
1. Fully Funded PhD in Terahertz and optical metrology of semiconductor material changes
Summary of Funded PhD Program
In this project you will use THz, near-infrared, and visible light to measure subtle changes in structure and conductivity induced by exposure to light (pulses). You will focus on materials currently relevant for the semiconductor industry, and on those relevant for future applications. The spatial scales at which these subtle light-induced changes occur is determined by the pump laser exposure area and can be in the sub-micrometer to tens of micrometer range. This is below the diffraction limit of THz light which has wavelengths in the several tens to hundreds of micrometer range. For this reason, you will explore near-field techniques when using THz light to measure conductivity. Higher (~ a few microns) resolution imaging will be used for visible/near-IR probing to measure small reflection changes induced by subtle morphological/conductivity changes induced by ultrashort laser pulses.
Application Deadline: Open until filled
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2. Fully Funded PhD in Electron-induced damage mechanisms in SEM imaging
Summary of Funded PhD Program
The goal of the project is to learn more about the possible detrimental effects of electrons in scanning electron microscopy for metrology applications, on materials used in the semiconductor industry. As a PhD student you will use state of the art tools to unravel and quantify the physical and chemical changes at surfaces and within layers upon irradiation by electrons. You will determine the role of effects like charging, electron-stimulated reactions, and defect formation, and determine to which extent the resulting modifications can be compared with light-induced damage.
Application Deadline: Open until filled
3. Fully Funded PhD in Hydrodynamics of droplet-laser interaction for EUV lithography
Summary of Funded PhD Program
Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. The use of such lasers leads to low overall efficiency in converting electrical power to useful EUV light. Replacing gas lasers with much more efficient solid-state lasers may significantly improve efficiency, as well as output power.
Application Deadline: Open until filled
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4. Fully Funded PhD in Imaging Spectroscopy for Broadband EUV Source Size Characterization
Summary of Funded PhD Program
Laser-produced tin plasmas are the sources of extreme ultraviolet (EUV) radiation at 13.5-nm wavelength powering state-of-the-art lithography. Ever higher EUV powers are required, to produce ever smarter semiconductor devices. Changing the conditions in the EUV light source results in changes in emitted radiation that must be studied and understood. Besides the required EUV light, radiation is produced in a broad wavelength band, which may be harmful in the lithography process. At the same time this radiation provides a diagnostic window into the plasma itself.
Application Deadline: Open until filled
5. Fully Funded PhD in Computational imaging and metrology through a multimode fiber
Summary of Funded PhD Program
As a PhD student, you will develop new approaches to sparsity-based subwavelength imaging through optical fibers. New techniques will connect several modern and dynamic research areas that are still unconnected to date: computational imaging, complex wavefront shaping, compressive sensing and metrology. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography.
Application Deadline: Open until filled
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6. Fully Funded PhD in Resolving Surface Reactions in Plasma Catalysis (SURPLAS)
Summary of Funded PhD Program
In the SURPLAS project, we will determine the surface reaction mechanisms of catalysts in plasma and demonstrate the rational design of plasma catalysts for CO2 hydrogenation. As a PhD student, you will compare the interaction of catalytically active metals favoring different products and determine the details of reaction pathways at the surface. You will learn to prepare atomically clean surfaces in ultra-high vacuum and perform spectroscopy experiments to determine their active state live during exposure to plasma. Using photoelectron spectroscopy, you will analyze the surface composition and oxidation state of the active surface, allowing conclusions on the reaction mechanism.
Application Deadline: Open until filled
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